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Structured ZnO-based contacts deposited by non-reactive rf magnetron sputtering on ultra-thin SiO2/Si through a stencil mask

Barnabé, Antoine and Lalanne, Maëva and Presmanes, Lionel and Soon, J.M. and Tailhades, Philippe and Dumas, Carine and Grisolia, Jérémie and Arbouet, A. and Paillard, Vincent and Ben Assayag, G. and van den Boogaart, M.A.F. and Savu, V. and Brugger, Jürgen and Normand, P. Structured ZnO-based contacts deposited by non-reactive rf magnetron sputtering on ultra-thin SiO2/Si through a stencil mask. (2009) Thin Solid Films, vol. 518 (n° 4). 1044-1047 . ISSN 0040-6090

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Official URL: http://dx.doi.org/10.1016/j.tsf.2009.03.232

Abstract

In this paper, we study the localized deposition of ZnO micro and nanostructures deposited by non-reactive rf-magnetron sputtering through a stencil mask on ultra-thin (10 nm) SiO2 layers containing a single plane of silicon nanocrystals (NCs), synthetized by ultra-low energy ion implantation followed by thermal annealing. The localized ZnO-deposited areas are reproducing the exact stencil mask patterns. A resistivity of around 5×10−3 Ω cm is measured on ZnO layer. The as-deposited ZnO material is 97% transparent above the wavelength at 400 nm. ZnO nanostructures can thus be used as transparent electrodes for Si NCs embedded in the gate-oxide of MOS devices.

Item Type:Article
Additional Information:Thanks to Elsevier editor. The definitive version is available at http://www.sciencedirect.com The original PDF of the article can be found at Thin Solid Films website : http://www.sciencedirect.com/science/journal/00406090
Audience (journal):International peer-reviewed journal
Uncontrolled Keywords:
Institution: Université de Toulouse > Institut National Polytechnique de Toulouse - INPT
Université de Toulouse > Université Paul Sabatier-Toulouse III - UPS
Other partners > NCSR Demokritos (GREECE)
Université de Toulouse > Institut National des Sciences Appliquées de Toulouse - INSA
French research institutions > Centre National de la Recherche Scientifique - CNRS
Other partners > Ecole Polytechnique Fédérale de Lausanne - EPFL (SWITZERLAND)
Laboratory name:
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Deposited By: Nihad Lahdifi
Deposited On:21 Jul 2010 13:36

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