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Growth of titanium dioxide thin layers by low pressure chemical vapor deposition (LPCVD) and chemical vapor infiltration (CVI) for photocatalytic uses

Duminica, Florin-Daniel and Maury, Francis and Costinel , Diana Growth of titanium dioxide thin layers by low pressure chemical vapor deposition (LPCVD) and chemical vapor infiltration (CVI) for photocatalytic uses. (2006) Revue Roumaine de Chimie, vol. 57 (n° 1). pp. 52-57. ISSN 0035-3930

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Abstract

We present preliminary results of a work aiming the growth of titanium dioxide thin layers by Low-Pressure Chemical Vapour Deposition (LPCVD) and by Chemical Vapour Infiltration (CVI). These TiO2 coatings are grown on glass plates (LPCVD) and on porous substrates made of micro-fibres (13 - 17 μm in diameter) of fused silica (CVI). The precursor used as organometallic source was Ti(OiPr)4. As-grown films were morphologically, optically and structurally characterized, and then submitted to photocatalytic tests using aqueous orange G solutions. The films grown on glass plates show a columnar growth mode. These films exhibit a good crystallinity and are constituted of anatase orientated (211) and (101) depending of their position in the reactor. The films grown on fused silica micro-fibres show a good surface coverage and exhibit a micro-porous structure due to the high surface curvature of the substrates. The photocatalytic activity was investigated for two TiO2 films with different thicknesses (70 and 200 nm) grown on porous samples.

Item Type:Article
Additional Information:Thanks to Academie Roumaine editor. The definitive version is available at http://www.ear.ro/3brevist/rv44/rv44.htm The original PDF of the article can be found at Revue Roumaine de Chimie website : http://www.ear.ro/3brevist/rv44/rv44.htm Article in Rumanian language Appeared under the Rumanian title : Elaborari de straturi subtiri de TiO2 prin LPCVD si CVI pentru aplicatii fotocatalitice
Audience (journal):International peer-reviewed journal
Uncontrolled Keywords:
Institution:Other partners > National Research and Development Institute for Cryogenics and Isotopic Technologies - ICSI Rm.Valcea (ROMANIA)
Université de Toulouse > Institut National Polytechnique de Toulouse - INPT
Université de Toulouse > Université Paul Sabatier-Toulouse III - UPS
French research institutions > Centre National de la Recherche Scientifique - CNRS
Laboratory name:
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Deposited By: Celine Cabaup

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