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Preparation and characterization of MOCVD-fabricated TiO2: thin films deposited on titanium for biomedical applications

Popescu, Simona and Demetrescu, Ioana and Gleizes, Alain Preparation and characterization of MOCVD-fabricated TiO2: thin films deposited on titanium for biomedical applications. (2007) Revue Roumaine de Chimie, vol. 58 (n° 9). pp. 880-885. ISSN 0035-3930

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Abstract

Titanium oxide (TiO2) thin films devoted to biomedical application were obtained by the chemical vapour deposition method. The films were deposited on titanium substrate using a low-pressure reactor with various precursor molar fractions and deposition temperatures. The influence of these parameters on film properties xas studied by using electron microscopy images, roughness measuring, X-ray diffraction, contact angle measuring and cyclic polarisation tests.

Item Type:Article
Additional Information:Thanks to Academie Roumaine editor. The definitive version is available at http://www.ear.ro/3brevist/rv44/rv44.htm The original PDF of the article can be found at Revue Roumaine de Chimie website : http://www.ear.ro/3brevist/rv44/rv44.htm
Audience (journal):International peer-reviewed journal
Uncontrolled Keywords:
Institution: Université de Toulouse > Institut National Polytechnique de Toulouse - INPT
Université de Toulouse > Université Paul Sabatier-Toulouse III - UPS
Other partners > University Politechnica of Bucharest (ROMANIA)
French research institutions > Centre National de la Recherche Scientifique - CNRS
Laboratory name:
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Deposited By: Celine Cabaup
Deposited On:02 Jul 2009 08:30

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