Popescu, Simona and Demetrescu, Ioana and Gleizes, Alain Preparation and characterization of MOCVD-fabricated TiO2: thin films deposited on titanium for biomedical applications. (2007) Revue Roumaine de Chimie, vol. 58 (n° 9). pp. 880-885. ISSN 0035-3930
| (Document in English) PDF (Publisher's version) - Depositor and staff only - Requires a PDF viewer such as GSview, Xpdf or Adobe Acrobat Reader 2281Kb |
Abstract
Titanium oxide (TiO2) thin films devoted to biomedical application were obtained by the chemical vapour deposition method. The films were deposited on titanium substrate using a low-pressure reactor with various precursor molar fractions and deposition temperatures. The influence of these parameters on film properties xas studied by using electron microscopy images, roughness measuring, X-ray diffraction, contact angle measuring and cyclic polarisation tests.
| Item Type: | Article |
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| Additional Information: | Thanks to Academie Roumaine editor. The definitive version is available at http://www.ear.ro/3brevist/rv44/rv44.htm The original PDF of the article can be found at Revue Roumaine de Chimie website : http://www.ear.ro/3brevist/rv44/rv44.htm |
| Audience (journal): | International peer-reviewed journal |
| Uncontrolled Keywords: | |
| Institution: | Université de Toulouse > Institut National Polytechnique de Toulouse - INPT Université de Toulouse > Université Paul Sabatier-Toulouse III - UPS Other partners > University Politechnica of Bucharest (ROMANIA) French research institutions > Centre National de la Recherche Scientifique - CNRS |
| Laboratory name: | |
| Statistics: | download |
| Total amount of citations (from ISI Web of Science): | 3 |
| Deposited By: | Celine Cabaup |
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