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Protective Alumina Coatings by Low Temperature Metalorganic Chemical Vapour Deposition

Sovar, Maria-Magdalena and Samélor, Diane and Gleizes, Alain and Alphonse, Pierre and Perisanu , S. and Vahlas, Constantin Protective Alumina Coatings by Low Temperature Metalorganic Chemical Vapour Deposition. (2007) Advanced Materials Research, vol. 23 . pp. 245-248. ISSN 1022-6680

(Document in English)

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Official URL: http://dx.doi.org/10.4028/www.scientific.net/AMR.23.245


Alumina thin films were processed from aluminium tri-iso-propoxide in a horizontal, with N2 as a carrier gas, occasional addition of water in the gas phase, deposition temperature in the range 350-700°C, total pressure 0.67 kPa (2 kPa when water was used). The films do not diffract X-ray when prepared below 700°C. At 700°C, they start to crystallize as γ-alumina. EDS, EPMA, ERDA, RBS, FTIR and TGA revealed that films prepared in the range 350- 415°C, without water in the gas phase, have an overall composition Al2O3-x(OH)2x, with x tending to 0 with increasing temperature. Al2O3 is obtained above 415°C. When water is added in the vapour phase, the film composition is Al2O3, even below 415°C. Coatings deposited in these conditions show promising protection properties.

Item Type:Article
Additional Information:Thanks to Trans Tech Publications editor. The definitive version is available at www.scientific.net The original PDF of the article can be found at Advanced Materials Research website : http://www.ttp.net/1022-6680.html
Audience (journal):International peer-reviewed journal
Uncontrolled Keywords:
Institution: Université de Toulouse > Institut National Polytechnique de Toulouse - INPT
Université de Toulouse > Université Paul Sabatier-Toulouse III - UPS
French research institutions > Centre National de la Recherche Scientifique - CNRS
Other partners > University Politechnica of Bucharest (ROMANIA)
Laboratory name:
Deposited By: Celine Cabaup
Deposited On:15 Jun 2009 12:49

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