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Investigations on the Diffusion of Oxygen in Nickel at 1000°C by SIMS Analysis

Pérusin, Simon and Monceau, Daniel and Andrieu, Eric Investigations on the Diffusion of Oxygen in Nickel at 1000°C by SIMS Analysis. (2005) Journal of The Electrochemical Society (JES), vol. 152 (n° 12). pp. 390-397. ISSN 0013-4651

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Official URL: http://dx.doi.org/10.1149/1.2116787

Abstract

High-purity polycrystalline nickel foils have been oxidized at 1000°C in laboratory air before being analyzed in secondary ion mass spectrometry to locally measure the oxygen content in solid solution. The values obtained in metallic grains are surprisingly the same before and after the oxidation treatments (between 5 and 10 atom ppm) and they are much lower than the ones predicted from the literature solubility and diffusion coefficient data at 1000°C. It is shown that this discrepancy could have its origins in the purity level of the samples but also in the exclusive oxygen diffusion in nickel grain boundaries. This last assumption is supported by the occurrence of nickel oxide particles on the walls of voids located in grain boundaries.

Item Type:Article
Additional Information:Thanks to Electrochemical Society editor. The definitive version is available at http://scitation.aip.org The original PDF of the article can be found at Journal of The Electrochemical Society website : http://www.ecsdl.org/JES/
Audience (journal):International peer-reviewed journal
Uncontrolled Keywords:
Institution: Université de Toulouse > Institut National Polytechnique de Toulouse - INPT
Université de Toulouse > Université Paul Sabatier-Toulouse III - UPS
French research institutions > Centre National de la Recherche Scientifique - CNRS
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Deposited By: Celine Cabaup
Deposited On:10 Jun 2009 07:25

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