Malfant, Isabelle and Rivasseau , Klauss and Fraxedas, J. and Faulmann , Christophe and De Caro, D. and Valade, L. and Kaboub , Lakhemici and Fabre, Jean Marc and Senocq, François Metallic Polycrystalline Thin Films of the Single-Component Neutral Molecular Solid Ni(tmdt)2. (2006) Journal of the American Chemical Society, vol. 128 (n° 17). pp. 5612-5613. ISSN 0002-7863
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Official URL: http://dx.doi.org/10.1021/ja060690s
Abstract
Metallic thin films of the single-component, neutral, molecular solid Ni(tmdt)2 have been prepared by electrocrystallization on passivated silicon substrates. Metallicity is achieved down to 6 K despite the polycrystalline morphology.
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