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Metallic Polycrystalline Thin Films of the Single-Component Neutral Molecular Solid Ni(tmdt)2

Malfant, Isabelle and Rivasseau , Klauss and Fraxedas, J. and Faulmann , Christophe and De Caro, D. and Valade, L. and Kaboub , Lakhemici and Fabre, Jean-Marc and Senocq, François Metallic Polycrystalline Thin Films of the Single-Component Neutral Molecular Solid Ni(tmdt)2. (2006) Journal of the American Chemical Society, vol. 128 (n° 17). pp. 5612-5613. ISSN 0002-7863

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Official URL: http://dx.doi.org/10.1021/ja060690s

Abstract

Metallic thin films of the single-component, neutral, molecular solid Ni(tmdt)2 have been prepared by electrocrystallization on passivated silicon substrates. Metallicity is achieved down to 6 K despite the polycrystalline morphology.

Item Type:Article
Additional Information:Thanks to American Chemical Society editor. The definitive version is available at http://pubs.acs.org The original PDF of the article can be found at Journal of the American Chemical Society website : http://pubs.acs.org/journal/jacsat
Audience (journal):International peer-reviewed journal
Uncontrolled Keywords:
Institution:Other partners > Ecole Nationale Supérieure de Chimie de Montpellier - ENSCM (FRANCE)
Université de Toulouse > Institut National Polytechnique de Toulouse - INPT
Other partners > Universitat Autònoma de Barcelona - UAB (SPAIN)
Université de Toulouse > Université Paul Sabatier-Toulouse III - UPS
French research institutions > Centre National de la Recherche Scientifique - CNRS
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Deposited By:Celine Cabaup

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