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An experimental and computational analysis of a MOCVD process for the growth of Al films using DMEAA

Xenidou, Theodora C. and Boudouvis, Andreas G. and Markatos, Nicholas C. and Samélor, Diane and Senocq, François and Prud’homme, Nathalie and Vahlas, Constantin An experimental and computational analysis of a MOCVD process for the growth of Al films using DMEAA. (2007) Surface and Coatings Technology, vol. 201 (n° 22 - 23). pp. 8868-8872. ISSN 0257-8972

(Document in English)

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Official URL: http://dx.doi.org/10.1016/j.surfcoat.2007.04.080


The analysis of a metal-organic chemical vapor deposition (MOCVD) process is performed by combining computational fluid dynamics (CFD) simulations and experimental measurements. The analysis is applied to a vertical, cold-wall reactor, where aluminum coatings are grown from dimethylethylamine alane (DMEAA), under low-pressure conditions. A two-dimensional model, based on the finite-volume method, is developed to predict the thermal and hydrodynamic characteristics of the flow within the MOCVD reactor, and the simulation results are compared with experimental data. It is shown that the computational predictions of the growth rates are in fair agreement with the experimental measurements.

Item Type:Article
Additional Information:Thanks to Elsevier editor. The definitive version is available at http://www.sciencedirect.com The original PDF of the article can be found at Surface and Coatings Technology website : http://www.sciencedirect.com/science/journal/02578972
Audience (journal):International peer-reviewed journal
Uncontrolled Keywords:
Institution: Université de Toulouse > Institut National Polytechnique de Toulouse - INPT
Other partners > National Technical University of Athens - NTUA (GREECE)
Université de Toulouse > Université Paul Sabatier-Toulouse III - UPS
French research institutions > Centre National de la Recherche Scientifique - CNRS
Laboratory name:
Deposited By: Celine Cabaup
Deposited On:25 May 2009 08:01

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