N-doped TiO2 coatings grown by atmospheric pressure MOCVD for visible light-induced photocatalytic activity

Abstract

N-doped TiO2 films were deposited by atmospheric pressure CVD from titanium tetra-isopropoxide (TTIP) and N2H4 as reactive gas in the temperature range 400–500 °C on various substrates. The films grown at 400 °C are amorphous and exhibit a compact structure and a smooth surface morphology. Increasing the deposition temperature first leads to the crystallization in the anatase structure (temperature range 410–450 °C) and then to the formation of rutile, so that an anatase-rutile mixture is observed in the temperature range 450–500 °C. Correlation between the structure, the morphology, optical properties, hydrophilicity and photocatalytic activity of the thin films both under UVand VIS light are presented and discussed in relation with deposition conditions.