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Growth of TiO2 thin films by AP-MOCVD on stainless steel substrates for photocatalytic applications

Duminica, Florin-Daniel and Maury, Francis and Hausbrand, R. Growth of TiO2 thin films by AP-MOCVD on stainless steel substrates for photocatalytic applications. (2007) Surface and Coatings Technology, vol. 201 (n° 22 - 23). pp. 9304-9308. ISSN 0257-8972

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Official URL: http://dx.doi.org/10.1016/j.surfcoat.2007.04.011

Abstract

TiO2 thin films were deposited under atmospheric pressure by MOCVD in the temperature range 400–600 °C on stainless steel and Si(100) substrates. Titanium tetraisopropoxide (TTIP) was used as Ti and O source. Single-phased anatase and bi-phased (anatase/rutile) coatings with controlled composition have been deposited depending on the temperature and the TTIP mole fraction. The films grown on stainless steel at low temperature (b420 °C) and low TTIP mole fraction (b10−4) are constituted of pure anatase and they exhibit a high photocatalytic activity under UV light and a high hydrophilicity. In the temperature range 430–600 °C the rutile starts growing leading to anatase/rutile mixtures and subsequently to a progressive decrease of both photocatalytic activity and wettability. Correlations between functional properties and microstructure of the films are discussed.

Item Type:Article
Additional Information:Thanks to Elsevier editor. The definitive version is available at http://www.sciencedirect.com The original PDF of the article can be found at Surface and Coatings Technology website : http://www.sciencedirect.com/science/journal/02578972
Audience (journal):International peer-reviewed journal
Uncontrolled Keywords:
Institution: Université de Toulouse > Institut National Polytechnique de Toulouse - INPT
Other partners > Arcelor Mittal Research (FRANCE)
Université de Toulouse > Université Paul Sabatier-Toulouse III - UPS
French research institutions > Centre National de la Recherche Scientifique - CNRS
Laboratory name:
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Deposited By: Celine Cabaup

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