Mauvernay, Bruno and Presmanes, Lionel and Capdeville, Stéphanie and De Resende, Valdirene Gonzaga and De Grave, Eddy and Bonningue, Corine and Tailhades, Philippe Elaboration and characterization of Fe1–xO thin films sputter deposited from magnetite target. (2007) Thin Solid Films, vol. 515 (n° 16). pp. 6532-6536. ISSN 0040-6090
(Document in English)
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Official URL: http://dx.doi.org/10.1016/j.tsf.2006.11.131
Majority of the authors report elaboration of iron oxide thin films by reactive magnetron sputtering from an iron target with Ar–O2 gas mixture. Instead of using the reactive sputtering of a metallic target we report here the preparation of Fe1–xOthin films, directly sputtered froma magnetite target in a pure argon gas flow with a bias power applied. This oxide is generally obtained at very low partial oxygen pressure and high temperature.We showed that bias sputtering which can be controlled very easily can lead to reducing conditions during deposition of oxide thin film on simple glass substrates. The proportion of wustite was directly adjusted bymodifying the power of the substrate polarization. Atomic force microscopy was used to observe these nanostructured layers. Mössbauer measurements and electrical properties versus bias polarization and annealing temperature are also reported.
|Additional Information:||Thanks to Elsevier editor. The definitive version is available at http://www.sciencedirect.com The original PDF of the article can be found at Thin Solid Films website : http://www.sciencedirect.com/science/journal/00406090|
|Audience (journal):||International peer-reviewed journal|
|Institution:||Université de Toulouse > Institut National Polytechnique de Toulouse - INPT (FRANCE)|
?? univ-ghent ??
Université de Toulouse > Université Paul Sabatier-Toulouse III - UPS (FRANCE)
French research institutions > Centre National de la Recherche Scientifique - CNRS (FRANCE)
|Deposited By:||Celine Cabaup|
|Deposited On:||05 May 2009 08:49|
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