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Quasi-static drainage in nano-slits network with non-uniform depth designed by grayscale laser lithography

Naillon, Antoine and Massadi, Hajar and Courson, Rémi and Bekhit, Jean and Seveno, Lucie and Calmon, Pierre-François and Prat, Marc and Joseph, Pierre Quasi-static drainage in nano-slits network with non-uniform depth designed by grayscale laser lithography. (2017) Microfluidics and Nanofluidics, 21 (131). 2-14. ISSN 1613-4982

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Official URL: http://dx.doi.org/10.1007/s10404-017-1970-z

Abstract

A method is reported to fabricate silicon–glass nanofluidic chips with non-uniform channel depths in the range 20–500 nm and micrometer resolution in width. The process is based on grayscale laser lithography to structure photoresist in 2.5 dimensions in a single step, followed by a reactive ion etching to transfer the resist depth profile into silicon. It can be easily integrated in a complete process flow chart. The method is used to fabricate a network of interconnected slits of non-uniform depth, a geometry mimicking a nanoporous medium. The network is then used to perform a pressure step-controlled drainage experiment, i.e., the immiscible displacement of a wetting fluid (liquid water) by a non-wetting one (nitrogen). The drainage patterns are analyzed by comparison with simulations based on the invasion percolation algorithm. The results indicate that slow drainage in the considered nanofluidic system well corresponds to the classical capillary fingering regime.

Item Type:Article
Additional Information:Thanks to Springer Verlag editor. The original PDF of the article can be found at : https://link.springer.com/article/10.1007%2Fs10404-017-1970-z
Audience (journal):International peer-reviewed journal
Uncontrolled Keywords:
Institution:French research institutions > Centre National de la Recherche Scientifique - CNRS (FRANCE)
Université de Toulouse > Institut National Polytechnique de Toulouse - INPT (FRANCE)
Université de Toulouse > Institut National des Sciences Appliquées de Toulouse - INSA (FRANCE)
Université de Toulouse > Université Toulouse III - Paul Sabatier - UPS (FRANCE)
Other partners > Kloé SA (FRANCE)
Laboratory name:
Funders:
INSIS-CNRS institute - NEEDS-MIPOR CNRS program
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Deposited By: Marc PRAT
Deposited On:18 May 2018 13:26

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