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Silicon Chemical Vapor Deposition on macro and submicron powders in a fluidized bed

Cadoret, Loic and Reuge, Nicolas and Pannala, Sreekanth and Syamlal, Madhava and Rossignol, Cécile and Dexpert-Ghys, Jeannette and Coufort, Carole and Caussat, Brigitte Silicon Chemical Vapor Deposition on macro and submicron powders in a fluidized bed. (2008) Powder Technology . ISSN 0032-5910

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Official URL: http://dx.doi.org/10.1016/j.powtec.2008.04.083

Abstract

Titanium oxide (TiO2) submicron powders have been treated by Chemical Vapor Deposition (CVD) in a vibro-fluidized bed in order to deposit silicon layers of nanometer scale on each individual grain from silane (SiH4). Experimental results show that for the conditions tested, the original granular structure of the powders is preserved for 90% of the initial bed weight while the remaining 10% consists of agglomerates in millimetre range found near the distributor of the reactor. A comparison between experimental and modelling results using the MFIX code shows that for Geldart's Group B alumina particles (Al2O3), the model represents both the bed hydrodynamics and silane conversion rates quite well. The future objective is to extend the simulation capability to cohesive submicron powders in order to achieve better predictability of the phenomena governing ultrafine particles.

Item Type:Article
Additional Information:Article in press. Thanks to Elsevier editor. The definitive version is available at http://www.sciencedirect.com The original PDF of the article can be found at Powder Technology website : http://www.sciencedirect.com/science/journal/00325910
Audience (journal):International peer-reviewed journal
Uncontrolled Keywords:
Institution: Université de Toulouse > Institut National Polytechnique de Toulouse - INPT
Université de Toulouse > Université Paul Sabatier-Toulouse III - UPS
French research institutions > Centre National de la Recherche Scientifique - CNRS
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Deposited By: Hélène Dubernard

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