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Synthesis and characterization of La2NiO4+δ coatings deposited by reactive magnetron sputtering using plasma emission monitoring

Fondard, Jérémie and Billard, Alain and Bertrand, Ghislaine and Briois, Pascal Synthesis and characterization of La2NiO4+δ coatings deposited by reactive magnetron sputtering using plasma emission monitoring. (2014) Solid State Ionics, 265. 73-79. ISSN 0167-2738

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Official URL: http://dx.doi.org/10.1016/j.ssi.2014.07.017

Abstract

This work focuses on the structural and electrical characterization of La–Ni–O coatings deposited by reactive magnetron sputtering using Plasma Emission Monitoring (PEM) which allows high deposition rate. The optimal regulation setpoint for lanthanumdeposition is determined and then the current dissipated on the nickel target is adjusted to obtain the convenient La/Ni ratio to achieve the K2NiF4 structure. After an appropriate annealing treatment, all coatings exhibit crystalline structures that depend on the La/Ni ratio. Some cracks appear on samples deposited on alumina substrates depending to the argon flow rate and influence their electrical behavior.

Item Type:Article
Additional Information:Thanks to Elsevier editor. The definitive version is available at http://www.sciencedirect.com The original PDF of the article can be found at Thermochimica Acta website : http://www.sciencedirect.com/science/journal/01672738
HAL Id:hal-01073884
Audience (journal):International peer-reviewed journal
Uncontrolled Keywords:
Institution:French research institutions > Centre National de la Recherche Scientifique - CNRS (FRANCE)
Université de Toulouse > Institut National Polytechnique de Toulouse - INPT (FRANCE)
Université de Toulouse > Université Toulouse III - Paul Sabatier - UPS (FRANCE)
Other partners > Université de Franche-Comté (FRANCE)
Other partners > Université de Technologie de Belfort-Montbéliard - UTBM (FRANCE)
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Deposited By: cirimat webmestre
Deposited On:10 Oct 2014 14:32

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